Input Power
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- AC 208-240V Single Phase, 50/60 Hz
- 1.5 KW (for glove box); 2.5 KW ( for PVD coaters)
- Total: 4.0 KW
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Glove-Box
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- Chamber dimension: 1200 mm L x 740 mm W x 900 mm H
- The gas purification station is included to ensure O2 & H2O less than 1ppm) in the glove box.
- Case Material: Stainless steel 304 with 3 mm thickness
- Chamber dimension: 1200 mm L x 740 mm W x 900 mm H
- Openable front window panel (tempered glass, 8 mm thick) for easy device loading
- Please Click Picture left for detail specification
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Vacuum Chamber and sample holder
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- The vacuum chamber is made of SS304 and recessed in the bottom of the glovebox
- The top flange is the hinged type and operable manually
- Two quartz windows are installed in the chamber fro observation.
- Plasma sputtering head and two evaporation heater are installed on the bottom of the chamber.
- One rotary sample holder is built-in the top of the flange which can hold max. 4" sample
- Rotating speed: 5 rpm
- One rotary shutter is built-in the bottom of the flange, which will cover two coating source during one source working to avoid the cross-contamination.
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RF Plasma Generator & Sputtering Head ( click the picture to see detailed specs)
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- One 13.5 MHz, 300 W RF Generator with automatic matching function is installed in the outside glovebox and connected to 2" sputtering head (click picture 1 to see detailed specs).
- One 2" Magnetron Sputtering Heads with water cooling jackets are inserted into the vacuum chamber from the bottom of the glovebox. (click picture 2 to see detailed specs).
- One 16 L/min digitally controlled recirculation water chiller is included for cooling magnetron sputtering heads (click the picture 3 to see detailed specs).
- The RF sputtering head can despite either insulation material or conductive material
- Pic.1 Pic. 2 Pic.3
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Thermal Evaporation
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- Two tungsten coil heaters with two B type of thermocouples and Alumina crucibles are built at the bottom of the vacuum chamber ( See Pic. 1)
- One digital temperature controller with 30 programmable segments and /- 1 ºC accuracy to control the heater (PIC. 2)
- One power switch is installed to change heating from one crucible to another by the same temperature controller
- Working temperature: 200ºC - 1700ºC
- Recommend Heating rate: 0.3 ºC/s (RT-1200 ºC) and 15 ºC/s (1200ºC - 1700 ºC)
- Four alumina crucibles (up to 1700 ºC) and two tungsten coil heaters are included. Please refer to the Optional section for ordering spare parts.
- Pic. 2
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Vacuum Pump
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- The KF25 vacuum port is installed to connect to a vacuum pump
- The highest vacuum may reach <4.0E-6 Torr by pumping overnight with optional Turbopump
- is included for vacuum up to 1.0E-6 TorPic.1
- A vacuum pump is optional. Please click Pic. 2 or 3 to order ( 10-2 torr) or turbopump ( 10-5 torr)
- Pic. 1 Pic. 2 Pic. 3
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In-Situ Film Thickness Monitor (Optional)
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- In-situ high precision thickness monitor for the thin film deposition process is recommended. It is based on the principle that the mass of a deposited film on a quartz crystal can be measured by monitoring the change in crystal’s oscillating frequency.
- Thickness accuracy: 0.1 Å
- Please click the picture left to see detailed specifications.
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Net Weight
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~800lbs |
Warranty
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One-year limited warranty (Consumable parts such as heating elements, processing tubes and o-rings are not covered by the warranty) |
Compliance
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- CE Certified
- NRTL certification (UL61010) or CSA certification is available upon request at extra cost.
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Operation Instructions
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